| Name: | MOCVD metal organic chemical vapor source |
| Introduction: | This family of devices Ⅲ,group elements, organic compounds and V,group elements, such as crystal growth hydride source material to thermal decomposition method for vapor phase epitaxy in the substrate, the growth of various Ⅲ-V family, Ⅱ-compound semiconductors and their solid solution of multi-layer single crystal materials. |
| Features: | lmachine modular, standardized design, the key parts are imported,
stable and reliable quality, quick installation, easy maintenance; lwork pressure closed loop control to improve process stability and
reliability; lgrowth process gas flow, substrate speed, substrate temperature,
growth chamber pressure of work by a computer process parameters
such as real-time control; luse of magnetic fluid sealing technology, samples can be 0 ~
1500rpm range of rotation; lcan be used for III - V nitride materials and low-dimensional or
multi-layer structure of the atmospheric pressure and low growth; lhave a power failure alarm, over temperature / under temperature
alarm, over temperature alarm limit, the reaction chamber pressure
in the alarm and other security features; lgrowth chamber, the background vacuum up to 1.010-5Pa, growth
pressure can be 1.0 ~ 1.010-5Pa set within the pretreatment chamber
of the vacuum up to 1.010-5Pa. |
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